Mimotogi, A. : rechercher sur Z-Library

Le plus grand référentiel d'articles scientifiques au monde. 70,000,000+ d'articles gratuitement.

Don't use scam websites

Livres
Articles (59)
Les plus populaires
Liste
- Liste
- Tableau

1

Hotspot prevention and detection method using an image-recognition technique based on higher-order local autocorrelation

Nosato, Hirokazu, Sakanashi, Hidenori, Takahashi, Eiichi, Murakawa, Masahiro, Matsunawa, Tetsuaki, Maeda, Shimon, Tanaka, Satoshi, Mimotogi, Shoji

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Année:

2014

Langue:

english

Fichier:

PDF, 5.70 MB

english, 2014

2

Optimization of directed self-assembly hole shrink process with simplified model

Yoshimoto, Kenji, Fukawatase, Ken, Ohshima, Masahiro, Naka, Yoshihiro, Maeda, Shimon, Tanaka, Satoshi, Morita, Seiji, Aoyama, Hisako, Mimotogi, Shoji

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Année:

2014

Langue:

english

Fichier:

PDF, 9.24 MB

english, 2014

3

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Alternative Lithographic Technologies VIII - Design for nanoimprint lithography: total layout refinement utilizing NIL process simulation

Bencher, Christopher, Cheng, Joy Y., Kobayashi, Sachiko, Komori, Motofumi, Ryoichi, Inanami, Yamashita, Kyoji, Mimotogi, Akiko, Im, Ji-Young, Hatano, Masayuki, Kono, Takuya, Maeda, Shimon

Année:

2016

Langue:

english

Fichier:

PDF, 1.89 MB

english, 2016

4

[Japan Society of Applied Physics Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference - Yokohama, Japan (6-8 July 1999)] Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference - Lithography simulator for EB/DUV intra-level mix and match

Inanami, R., Nakasugi, T., Sato, S., Mimotogi, S., Tanaka, S., Sugihara, K.

Année:

1999

Langue:

english

Fichier:

PDF, 164 KB

english, 1999

5

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Alternative Lithographic Technologies VI - The prospects of design for roll to roll lithography: layout refinement utilizing process simulation

Resnick, Douglas J., Bencher, Christopher, Kobayashi, Sachiko, Shimizu, Mitsuko, Tanaka, Satoshi, Furutono, Yohko, Hatano, Masayuki, Matsuki, Kazuto, Inanami, Ryoichi, Mimotogi, Shoji

Année:

2014

Langue:

english

Fichier:

PDF, 2.75 MB

english, 2014

6

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 24 February 2013)] Optical Microlithography XXVI - Solutions with precise prediction for thermal aberration error in low-k1 immersion lithography

Fukuhara, Kazuya, Conley, Will, Mimotogi, Akiko, Kono, Takuya, Aoyama, Hajime, Ogata, Taro, Kita, Naonori, Matsuyama, Tomoyuki

Année:

2013

Langue:

english

Fichier:

PDF, 2.18 MB

english, 2013

7

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Alternative Lithographic Technologies V - Novel error mode analysis method for graphoepitaxial directed self-assembly lithography based on the dissipative particle dynamics method

Kodera, Katsuyoshi, Tong, William M., Resnick, Douglas J., Maeda, Shimon, Tanaka, Satoshi, Mimotogi, Shoji, Seino, Yuriko, Yonemitsu, Hiroki, Sato, Hironobu, Azuma, Tsukasa

Année:

2013

Langue:

english

Fichier:

PDF, 1.43 MB

english, 2013

8

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology X - Yokohama, Japan (Wednesday 16 April 2003)] Photomask and Next-Generation Lithography Mask Technology X - Effects of local CD error on lithography performance

Mimotogi, Shoji, Tanabe, Hiroyoshi, Nojima, Shigeki, Hasebe, Shigeru

Année:

2003

Langue:

english

Fichier:

PDF, 580 KB

english, 2003

9

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - Immersion resist process for 32-nm node logic devices

Henderson, Clifford L., Ema, Tatsuhiko, Sho, Koutaro, Yonemitsu, Hiroki, Seino, Yuriko, Fujise, Hiroharu, Yamada, Akiko, Mimotogi, Shoji, Kitamura, Yosuke, Nagai, Satoshi, Fujii, Kotaro, Fukushima, Ta

Année:

2008

Langue:

english

Fichier:

PDF, 1.27 MB

english, 2008

10

SPIE Proceedings [SPIE Photomask and NGL Mask Technology XV - Yokohama, Japan (Wednesday 16 April 2008)] Photomask and Next-Generation Lithography Mask Technology XV - Scanner fleet management utilizing programmed hotspot patterns

Yoshida, Kenji, Horiuchi, Toshiyuki, Inoue, Soichi, Hashimoto, Koji, Tanaka, Satoshi, Satake, Masaki, Obara, Takashi, Takahata, Kazuhiro, Yamanaka, Eiji, Kariya, Mitsuyo, Morinaga, Hiroyuki, Mimotogi,

Année:

2008

Langue:

english

Fichier:

PDF, 4.14 MB

english, 2008

11

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Advanced Etch Technology for Nanopatterning II - Extension of patterning technologies down to sub-10nm half pitch

Mimotogi, Shoji, Zhang, Ying, Oehrlein, Gottlieb S., Lin, Qinghuang

Année:

2013

Langue:

english

Fichier:

PDF, 1.46 MB

english, 2013

12

SPIE Proceedings [SPIE Photomask and Next-Generation Lithography Mask Technology XIV - Yokohama, Japan (Tuesday 17 April 2007)] Photomask and Next-Generation Lithography Mask Technology XIV - Virtual lithography system to improve the productivity of high-mix low-volume production

Yoshida, Kenji, Watanabe, Hidehiro, Sato, Takashi, Kono, Takuya, Yamanaka, Eiji, Kariya, Mitsuyo, Inoue, Arata, Mimotogi, Shoji

Année:

2007

Langue:

english

Fichier:

PDF, 739 KB

english, 2007

13

SPIE Proceedings [SPIE Photomask and Next-Generation Lithography Mask Technology XIV - Yokohama, Japan (Tuesday 17 April 2007)] Photomask and Next-Generation Lithography Mask Technology XIV - Mask topography effects of hole patterns on hyper-NA lithography

Mimotogi, Akiko, Watanabe, Hidehiro, Itoh, Masamitsu, Mimotogi, Shoji, Sato, Kazuya, Sato, Takashi, Tanaka, Satoshi

Année:

2007

Langue:

english

Fichier:

PDF, 570 KB

english, 2007

14

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - Contact hole formation by multiple exposure technique in ultralow-k 1 lithography

Nakamura, Hiroko, Smith, Bruce W., Onishi, Yasunobu, Sato, Kazuya, Tanaka, Satoshi, Mimotogi, Shoji, Hashimoto, Koji, Inoue, Soichi

Année:

2004

Langue:

english

Fichier:

PDF, 318 KB

english, 2004

15

SPIE Proceedings [SPIE Photomask and NGL Mask Technology XV - Yokohama, Japan (Wednesday 16 April 2008)] Photomask and Next-Generation Lithography Mask Technology XV - Dependence of mask topography effects on pattern variation under hyper-NA lithography

Mimotogi, Akiko, Horiuchi, Toshiyuki, Itoh, Masamitsu, Mimotogi, Shoji, Sato, Kazuya, Sato, Takashi, Tanaka, Satoshi, Inoue, Soichi

Année:

2008

Langue:

english

Fichier:

PDF, 1013 KB

english, 2008

16

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 24 February 2008)] Optical Microlithography XXI - Prediction of imaging performance of immersion lithography using high refractive index fluid

Sato, Takashi, Itoh, Masamitsu, Mimotogi, Akiko, Mimotogi, Shoji, Sato, Kazuya, Tanaka, Satoshi, Levinson, Harry J., Dusa, Mircea V.

Année:

2008

Langue:

english

Fichier:

PDF, 335 KB

english, 2008

17

[Japan Soc. Applied Phys 2003 Symposium on VLSI Technology. Digest of Technical Papers - Kyoto, Japan (10-12 June 2003)] 2003 Symposium on VLSI Technology. Digest of Technical Papers (IEEE Cat. No.03CH37407) - ArF lithography technologies for 65 nm-node CMOS (CMOS5) with 30 nm logic gate and high density embedded memories

Hashimoto, K., Uesawa, F., Takahata, K., Kikuchi, K., Kanai, H., Shimizu, H., Shiobara, E., Takeuchi, K., Endo, A., Harakawa, H., Mimotogi, S.

Année:

2003

Langue:

english

Fichier:

PDF, 196 KB

english, 2003

18

[IEEE Digest of Papers Microprocesses and Nanotechnology 2005. 2005 International Microprocesses and Nanotechnology Conference - Tokyo, Japan (2005.10.25-2005.10.28)] Digest of Papers Microprocesses and Nanotechnology 2005 - Characterization of 45 nm att-PSM lithography with a hyper-NA ArF tool

Sato, T., Endo, A., Mimotogi, A., Mimotogi, S., Sato, K., Tanaka, S.

Année:

2005

Langue:

english

Fichier:

PDF, 177 KB

english, 2005

19

[IEEE Digest of Papers Microprocesses and Nanotechnology 2005. 2005 International Microprocesses and Nanotechnology Conference - Tokyo, Japan (2005.10.25-2005.10.28)] Digest of Papers Microprocesses and Nanotechnology 2005 - Low k/sub 1/ contact hole formation by double L&S formation method with contact hole mask and dipole illumination

Nakamura, H., Sato, K., Tanaka, S., Mimotogi, S., Inoue, S.

Année:

2005

Langue:

english

Fichier:

PDF, 814 KB

english, 2005

20

[Japan Soc. of Appl. Phys Digest of Papers Microprocesses and Nanotechnology 2003. 2003 International Microprocesses and Nanotechnology Conference - Tokyo, Japan (29-31 Oct. 2003)] Digest of Papers Microprocesses and Nanotechnology 2003. 2003 International Microprocesses and Nanotechnology Conference - Patterning strategy for random contact holes in ultra-low k/sub 1/ lithography condition

Mimotogi, S., Nakamura, H., Shiobara, E., Miyazaki, M., Inoue, S.

Année:

2003

Langue:

english

Fichier:

PDF, 98 KB

english, 2003

21

[IEEE 2013 18th Asia and South Pacific Design Automation Conference (ASP-DAC 2013) - Yokohama (2013.1.22-2013.1.25)] 2013 18th Asia and South Pacific Design Automation Conference (ASP-DAC) - Self-Aligned Double and Quadruple Patterning-aware grid routing with hotspots control

Kodama, C., Ichikawa, H., Nakayama, K., Kotani, T., Nojima, S., Mimotogi, S., Miyamoto, S., Takahashi, A.

Année:

2013

Langue:

english

Fichier:

PDF, 1.23 MB

english, 2013

22

Characterization of 45 nm Attenuated Phase Shift Mask Lithography with a Hyper Numerical Aperture ArF Tool

Sato, Takashi, Endo, Ayako, Mimotogi, Akiko, Mimotogi, Shoji, Sato, Kazuya, Tanaka, Satoshi

Journal:

Japanese Journal of Applied Physics

Année:

2006

Langue:

english

Fichier:

PDF, 148 KB

english, 2006

23

Development Process for Chemically Amplified Resist by KrF Imaging

Matsunaga, Kentaro, Kawamura, Daisuke, Mimotogi, Shoji, Azuma, Tsukasa, Onishi, Yasunobu

Journal:

Japanese Journal of Applied Physics

Année:

1998

Langue:

english

Fichier:

PDF, 482 KB

english, 1998

24

Lithography Simulator for Electon Beam/Deep UV Intra-Level Mix & Match

R. Inanami, T. Nakasugi, S. Sato, S. Mimotogi, S. Tanaka, K. Sugihara

Année:

1999

Langue:

english

Fichier:

PDF, 174 KB

english, 1999

25

Lowk1Contact Hole Formation by Double Line and Space Formation Method with Contact Hole Mask and Dipole Illumination

H. Nakamura, K. Sato, S. Tanaka, Y. Taniguchi, J. Abe, S. Mimotogi, S. Inoue

Année:

2006

Langue:

english

Fichier:

PDF, 471 KB

english, 2006

26

Resist Residue in Ion Implantation Level Lithography

Ojima, Tomoko, Asano, Masafumi, Takahashi, Masanori, Seino, Yuriko, Mimotogi, Shoji

Journal:

Japanese Journal of Applied Physics

Année:

2010

Langue:

english

Fichier:

PDF, 617 KB

english, 2010

27

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Optical Microlithography XXVII - Availability study of CFD-based Mask3D simulation method for next generation lithography technologies

Lai, Kafai, Erdmann, Andreas, Takahashi, M., Kawabata, Y., Washitani, T., Tanaka, S., Maeda, S., Mimotogi, S.

Année:

2014

Langue:

english

Fichier:

PDF, 654 KB

english, 2014

28

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Assessment of wafer pattern prediction accuracy by introducing effectively equivalent mask patterns

Satake, M., Mimotogi, A., Tanaka, S., Mimotogi, S., Hashimoto, K., Inoue, S., Hoga, Morihisa

Année:

2006

Langue:

english

Fichier:

PDF, 375 KB

english, 2006

29

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 24 February 2013)] Optical Microlithography XXVI - Study of recent CFD-based scheme for analyzing 3D mask effects

Takahashi, M., Conley, Will, Kodera, K., Motokubota, M., Kawabata, Y., Maeda, S., Nojima, S., Tanaka, S., Mimotogi, S.

Année:

2013

Langue:

english

Fichier:

PDF, 569 KB

english, 2013

30

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 23 February 2014)] Alternative Lithographic Technologies VI - DFM for defect-free DSA hole shrink process

Resnick, Douglas J., Bencher, Christopher, Fukawatase, Ken, Yoshimoto, Kenji, Ohshima, Masahiro, Naka, Yoshihiro, Maeda, Shimon, Tanaka, Satoshi, Morita, Seiji, Aoyama, Hisako, Mimotogi, Shoji

Année:

2014

Langue:

english

Fichier:

PDF, 2.28 MB

english, 2014

31

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Resist edge roughness with reducing pattern size

Shiobara, Eishi, Kawamura, Daisuke, Matsunaga, Kentaro, Koike, Toru, Mimotogi, Shoji, Azuma, Tsukasa, Onishi, Yasunobu

Année:

1998

Langue:

english

Fichier:

PDF, 1.63 MB

english, 1998

32

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - Development of an accurate empirical model for ArF lithography

Mimotogi, Shoji, Smith, Bruce W., Kawamura, Daisuke, Sato, Takashi, Inoue, Soichi

Année:

2004

Langue:

english

Fichier:

PDF, 139 KB

english, 2004

33

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Optical Microlithography XX - Performance of immersion lithography for 45-nm-node CMOS and ultra-high density SRAM with 0.25um 2

Mimotogi, Shoji, Flagello, Donis G., Uesawa, Fumikatsu, Tominaga, Makoto, Fujise, Hiroharu, Sho, Koutaro, Katsumata, Mikio, Hane, Hiroki, Ikegami, Atsushi, Nagahara, Seiji, Ema, Tatsuhiko, Asano, Masa

Année:

2007

Langue:

english

Fichier:

PDF, 560 KB

english, 2007

34

SPIE Proceedings [SPIE Photomask Technology 2002 - Monterey, CA (Tuesday 1 October 2002)] 22nd Annual BACUS Symposium on Photomask Technology - Flexible mask specifications

Nojima, Shigeki, Mimotogi, Shoji, Itoh, Masamitsu, Ikenaga, Osamu, Hasebe, Shigeru, Hashimoto, Kohji, Inoue, Soichi, Goto, Mineo, Mori, Ichiro, Grenon, Brian J., Kimmel, Kurt R.

Année:

2002

Langue:

english

Fichier:

PDF, 476 KB

english, 2002

35

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Metrology, Inspection, and Process Control for Microlithography XXVI - Novel prediction methodology for etched hole patterning failure

Miyoshi, Seiro, Abe, Hideaki, Takahata, Kazuhiro, Ojima, Tomoko, Kajiwara, Masanari, Mimotogi, Shoji, Hashimoto, Kohji, Starikov, Alexander

Année:

2012

Langue:

english

Fichier:

PDF, 3.49 MB

english, 2012

36

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Mask enhancement factor for 2D local CD error

Arisawa, Yukiyasu, Komuro, Masanori, Mimotogi, Shoji

Année:

2005

Langue:

english

Fichier:

PDF, 311 KB

english, 2005

37

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Optical Microlithography XXIII - Novel fine-tuned model-based SRAF generation method using coherence map

Kodera, Katsuyoshi, Dusa, Mircea V., Conley, Will, Tanaka, Satoshi, Yamaji, Mikiyasu, Kodama, Chikaaki, Kotani, Toshiya, Nojima, Shigeki, Hashimoto, Koji, Mimotogi, Shoji, Inoue, Soichi

Année:

2010

Langue:

english

Fichier:

PDF, 717 KB

english, 2010

38

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology X - Yokohama, Japan (Wednesday 16 April 2003)] Photomask and Next-Generation Lithography Mask Technology X - Enhanced flexible mask specifications

Hasebe, Shigeru, Tanabe, Hiroyoshi, Nojima, Shigeki, Mimotogi, Shoji, Tanaka, Satoshi, Ikenaga, Osamu, Hashimoto, Kohji, Inoue, Soichi, Mori, Ichiro

Année:

2003

Langue:

english

Fichier:

PDF, 186 KB

english, 2003

39

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Optical Microlithography XVIII - Impact of polarization for an attenuated phase-shift mask with ArF hyper-NA lithography

Sato, Takashi, Smith, Bruce W., Endo, Ayako, Mimotogi, Akiko, Mimotogi, Shoji, Sato, Kazuya, Tanaka, Satoshi

Année:

2005

Langue:

english

Fichier:

PDF, 306 KB

english, 2005

40

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Metrology, Inspection, and Process Control for Microlithography XIX - Sampling plan optimization for CD control in low k 1 lithography

Asano, Masafumi, Silver, Richard M., Koike, Toru, Mikami, Toru, Abe, Hideaki, Ikeda, Takahiro, Tanaka, Satoshi, Mimotogi, Shoji

Année:

2005

Langue:

english

Fichier:

PDF, 468 KB

english, 2005

41

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Design for Manufacturability through Design-Process Integration II - Concurrent development methodology from design rule to OPC in 45-nm node logic device

Konomi, Kenji, Singh, Vivek K., Rieger, Michael L., Nojima, Shigeki, Maeda, Shimon, Fujimaki, Takeshi, Igarashi, Hirofumi, Ogawa, Ryuji, Mimotogi, Shoji

Année:

2008

Langue:

english

Fichier:

PDF, 2.38 MB

english, 2008

42

SPIE Proceedings [SPIE Photomask and NGL Mask Technology XV - Yokohama, Japan (Wednesday 16 April 2008)] Photomask and Next-Generation Lithography Mask Technology XV - Impact of patterning strategy on mask fabrication beyond 32nm

Mimotogi, Shoji, Horiuchi, Toshiyuki, Higaki, Tomotaka, Kanai, Hideki, Tanaka, Satoshi, Satake, Masaki, Kitamura, Yosuke, Kodera, Katsuyoshi, Ishigo, Kazutaka, Kono, Takuya, Asano, Masafumi, Takahata,

Année:

2008

Langue:

english

Fichier:

PDF, 338 KB

english, 2008

43

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Design for Manufacturability through Design-Process Integration VI - Self-aligned double and quadruple patterning layout principle

Nakayama, Koichi, Kodama, Chikaaki, Kotani, Toshiya, Nojima, Shigeki, Mimotogi, Shoji, Miyamoto, Shinji, Mason, Mark E.

Année:

2012

Langue:

english

Fichier:

PDF, 2.09 MB

english, 2012

44

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Optical Microlithography XXV - Generator of predictive verification pattern using vision system based on higher-order local autocorrelation

Matsunawa, Tetsuaki, Maeda, Shimon, Ichikawa, Hirotaka, Nojima, Shigeki, Tanaka, Satoshi, Mimotogi, Shoji, Nosato, Hirokazu, Sakanashi, Hidenori, Murakawa, Masahiro, Takahashi, Eiichi, Conley, Will

Année:

2012

Langue:

english

Fichier:

PDF, 2.41 MB

english, 2012

45

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Optical Microlithography XXII - A novel fast 3D resist simulation method using Chebyshev expansion

Takahashi, Masanori, Levinson, Harry J., Dusa, Mircea V., Tanaka, Satoshi, Mimotogi, Shoji, Inoue, Soichi

Année:

2009

Langue:

english

Fichier:

PDF, 766 KB

english, 2009

46

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Optical Microlithography XXII - Feasibility of ultra-low k 1 lithography for 28nm CMOS node

Mimotogi, Shoji, Levinson, Harry J., Dusa, Mircea V., Takahata, Kazuhiro, Murakami, Takashi, Nagahara, Seiji, Takeda, Kazuhiro, Satake, Masaki, Kitamura, Yosuke, Ojima, Tomoko, Fujise, Hiroharu, Seino

Année:

2009

Langue:

english

Fichier:

PDF, 332 KB

english, 2009

47

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - Approach for reducing resist footing over nonplanar wafer

Endo, Ayako, Smith, Bruce W., Sato, Takashi, Asano, Masafumi, Mimotogi, Shoji, Inoue, Soichi

Année:

2004

Langue:

english

Fichier:

PDF, 264 KB

english, 2004

48

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Optical Microlithography XVI - Impact of across-pupil transmittance variation in projection lenses on fine device pattern imaging

Sato, Kazuya, Mimotogi, Shoji, Inoue, Soichi, Higashiki, Tatsuhiko, Yen, Anthony

Année:

2003

Langue:

english

Fichier:

PDF, 501 KB

english, 2003

49

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Optical Microlithography XVIII - Optical lithography technologies for 45-nm node CMOS

Mimotogi, Shoji, Smith, Bruce W., Uesawa, Fumikatsu, Kyoh, Suigen, Fujise, Hiroharu, Shiobara, Eishi, Katsumata, Mikio, Hane, Hiroki, Sugiyama, Tomohiro, Sho, Koutaro, Miyazaki, Maki, Takahata, Kazuhi

Année:

2005

Langue:

english

Fichier:

PDF, 496 KB

english, 2005

50

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Optical Microlithography XVIII - Evaluation of extendibility for Fourier diffraction theory for topographical mask structure under hyper NA lithography

Tanaka, Satoshi, Smith, Bruce W., Mimotogi, Akiko, Inoue, Soichi

Année:

2005

Langue:

english

Fichier:

PDF, 896 KB

english, 2005